BS ISO 15573:1998
能量在80KeV和300KeV之間的輻射處理用電子束設備劑量測定操作規程

Practice for dosimetry in an electron-beam facility for radiation processing at energies between 80 keV and 300 keV

被代替

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標準號

BS ISO 15573:1998

發布

1999年

發布單位

英國標準學會

替代標準

BS ISO 15573:1999

當前最新

BS ISO 15573:1998(2000)

 

 

被代替標準

97/703091 DC:1997

適用范圍

1 This practice covers dosimetric procedures to be followed to determine the performance of low energy (300 keV or lest) single-gap electron beam radiation processing facilities. Other practices and procedures related to facility characterization, product qualification, and routine pro-cessing are also discussed. 2 The electron energy range covered in this practice is from 80 keV to 300 keV. Such electron beams can be generated by single-gap self-contained thermal filament or plasma source accelerators. 3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appro-priate safety and health practices and determine the applica-bility of regulatory limitations prior to use.

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